Title :
Aluminum nitride films for optical applications
Author :
Dumitru, V. ; Cimpoiasu, Elena ; Morosanu, C. ; Nenu, Cristina ; Necsoiu, Dana
Author_Institution :
Politehnic Univ. of Bucharest, Romania
Abstract :
Hard and adherent AlN layers on glass have been deposited by reactive magnetron sputtering. The deposition rate, the structure and the optical properties have been investigated mainly with respect to possible optical applications
Keywords :
III-V semiconductors; X-ray diffraction; absorption coefficients; aluminium compounds; crystal structure; gradient index optics; optical films; refractive index; semiconductor growth; semiconductor thin films; sputter deposition; AlN; AlN films; absorption coefficient; adherent layers; deposition rate; graded index multilayers; hard layers; optical applications; reactive magnetron sputtering; refractive index; structure; Aluminum nitride; Fluid flow; Nitrogen; Optical films; Radio frequency; Sputtering; Thickness measurement; X-ray diffraction;
Conference_Titel :
Semiconductor Conference, 1996., International
Conference_Location :
Sinaia
Print_ISBN :
0-7803-3223-7
DOI :
10.1109/SMICND.1996.557473
