DocumentCode
2126945
Title
High resistance comparison among KRISS, VNIIM and NIM
Author
Kwang Min Yu ; Young Tae Park ; Je Cheon Ryu ; Kwon Su Han ; Semenov, Yu.P. ; Litvinov, B. ; Haiming, S.
Author_Institution
Div. of Electromagnetic Metrol., Korea Res. Inst. of Standards & Sci., Taejon, South Korea
fYear
2000
fDate
14-19 May 2000
Firstpage
68
Lastpage
69
Abstract
In a high resistance comparison among KRISS, VNIIM and NIM, the relative resistance values of measurement results agreed well within 2 ppm in 10 megohm and 5 ppm in 1 gigohm. Also, relative combined standard uncertainties of the three institutes is 4.9 ppm in 10 megohm and 11.6 ppm in 1 gigohm.
Keywords
Bridge circuits; Electric resistance measurement; Measurement uncertainty; Resistors; Transfer standards; 1 Gohm; 10 Mohm; QHE reference standard; Wheatstone bridge; high resistance comparison; international comparison; relative combined standard uncertainties; relative resistance; transportable high resistors; transportable standards; Bridge circuits; Current measurement; Detectors; Electrical resistance measurement; Insulation; Linearity; Measurement standards; Metrology; Resistors; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Precision Electromagnetic Measurements Digest, 2000 Conference on
Conference_Location
Sydney, NSW, Australia
Print_ISBN
0-7803-5744-2
Type
conf
DOI
10.1109/CPEM.2000.850880
Filename
850880
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