• DocumentCode
    2128070
  • Title

    A symmetric diagonal driver transistor SRAM cell with imbalance suppression technology for stable low voltage operation

  • Author

    Horiba, S. ; Takahashi, T. ; Ohkubo, H. ; Noda, K. ; Hayashi, F. ; Uchida, T. ; Yokoyama, T. ; Ando, K. ; Yoshida, T. ; Hashimoto, T. ; Shimizu, T.

  • Author_Institution
    ULSI Device Dev. Labs., NEC Corp., Kanagawa, Japan
  • fYear
    1996
  • fDate
    11-13 June 1996
  • Firstpage
    144
  • Lastpage
    145
  • Abstract
    A symmetric diagonal driver transistor (SDDT) cell has been developed for low voltage SRAM operation which exhibits high alignment tolerance. This new symmetric cell layout substantially suppresses the imbalance in a pair of cell transistor characteristics and, combined with silicon nitride self-aligned contact (Si/sub 3/N/sub 4/-SAC) and low resistance ground-line structures, results in a minimum operation voltage of 1.9 V, which is 0.3 V lower than that of the conventional split word line cell.
  • Keywords
    SRAM chips; integrated circuit technology; 1.9 V; Si/sub 3/N/sub 4/; alignment tolerance; ground-line structure; imbalance suppression technology; low voltage operation; silicon nitride self-aligned contact; symmetric diagonal driver transistor SRAM cell; Contact resistance; Driver circuits; Low voltage; Random access memory; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 1996. Digest of Technical Papers. 1996 Symposium on
  • Conference_Location
    Honolulu, HI, USA
  • Print_ISBN
    0-7803-3342-X
  • Type

    conf

  • DOI
    10.1109/VLSIT.1996.507826
  • Filename
    507826