DocumentCode
2128128
Title
Electrical performances of retrograde versus conventional profile MOSFETs
Author
Skotnicki, T. ; Bouillon, P.
Author_Institution
France Telecom, CNET, Grenoble, France
fYear
1996
fDate
11-13 June 1996
Firstpage
152
Lastpage
153
Abstract
Based on an improved current formulation, we show that in contrast to some recent reports the loss in current in Retrograde Channel Profile (RCP) devices is not inevitable. It is demonstrated theoretically and confirmed experimentally that when moving the peak of the RCP deeper into the bulk, the loss can be transformed into a significant gain. By applying deep Arsenic RCP we have improved the electrical performances of our 0.18 /spl mu/m (as drawn, 0.12 /spl mu/m electrical) MOSFETs compared with Phosphorus channel MOSFETs. A 12% increase in on-current and an almost 2 decade lower off-current are obtained.
Keywords
MOSFET; doping profiles; semiconductor doping; MOSFET; current drivability; electrical performance; retrograde channel profile; MOSFETs;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 1996. Digest of Technical Papers. 1996 Symposium on
Conference_Location
Honolulu, HI, USA
Print_ISBN
0-7803-3342-X
Type
conf
DOI
10.1109/VLSIT.1996.507829
Filename
507829
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