• DocumentCode
    2128128
  • Title

    Electrical performances of retrograde versus conventional profile MOSFETs

  • Author

    Skotnicki, T. ; Bouillon, P.

  • Author_Institution
    France Telecom, CNET, Grenoble, France
  • fYear
    1996
  • fDate
    11-13 June 1996
  • Firstpage
    152
  • Lastpage
    153
  • Abstract
    Based on an improved current formulation, we show that in contrast to some recent reports the loss in current in Retrograde Channel Profile (RCP) devices is not inevitable. It is demonstrated theoretically and confirmed experimentally that when moving the peak of the RCP deeper into the bulk, the loss can be transformed into a significant gain. By applying deep Arsenic RCP we have improved the electrical performances of our 0.18 /spl mu/m (as drawn, 0.12 /spl mu/m electrical) MOSFETs compared with Phosphorus channel MOSFETs. A 12% increase in on-current and an almost 2 decade lower off-current are obtained.
  • Keywords
    MOSFET; doping profiles; semiconductor doping; MOSFET; current drivability; electrical performance; retrograde channel profile; MOSFETs;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 1996. Digest of Technical Papers. 1996 Symposium on
  • Conference_Location
    Honolulu, HI, USA
  • Print_ISBN
    0-7803-3342-X
  • Type

    conf

  • DOI
    10.1109/VLSIT.1996.507829
  • Filename
    507829