• DocumentCode
    2128480
  • Title

    A low voltage graded-channel MOSFET (LV-GCMOS) for sub 1-volt microcontroller application

  • Author

    John, J.P. ; Ilderem, V. ; Changhae Park ; Teplik, J. ; Klein, K. ; Cheng, S.

  • Author_Institution
    Adv. Custom Technol., Motorola Inc., Mesa, AZ, USA
  • fYear
    1996
  • fDate
    11-13 June 1996
  • Firstpage
    178
  • Lastpage
    179
  • Abstract
    We report for the first time, a bulk silicon, low voltage graded-channel MOSFET (LV-GCMOS) capable of operating below 1 volt, while delivering the required circuit performance. Channel engineering enabled a lowering of the subthreshold slope by more than 10 mV/dec, allowing for a reduction in the threshold voltage without causing excessive leakage. A 1-Volt HC08 based microcontroller has been built with this technology, achieving >1 MHz operation at 0.9 V, with low stand-by leakage.
  • Keywords
    CMOS digital integrated circuits; MOSFET; ion implantation; leakage currents; microcontrollers; 0.9 V; 1 to 6 MHz; 30 nA; HC08 based microcontroller; channel engineering; graded-channel implantation; low stand-by leakage; low voltage graded-channel MOSFET; subthreshold slope lowering; threshold voltage reduction; twin well processing; Circuit optimization; Low voltage; MOSFET circuits; Microcontrollers; Silicon; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 1996. Digest of Technical Papers. 1996 Symposium on
  • Conference_Location
    Honolulu, HI, USA
  • Print_ISBN
    0-7803-3342-X
  • Type

    conf

  • DOI
    10.1109/VLSIT.1996.507843
  • Filename
    507843