DocumentCode :
2128769
Title :
350-nm band edge-emitting laser diodes enabled by low-dislocation-density AlGaN templates
Author :
Crawford, Mary H. ; Allerman, Andrew A. ; Armstrong, Andrew M. ; Wierer, Jonathan J. ; Chow, Weng W. ; Moseley, Michael W. ; Smith, Michael L. ; Cross, Karen C.
Author_Institution :
Sandia National Laboratories, Albuquerque, NM, USA
fYear :
2015
fDate :
13-15 July 2015
Firstpage :
121
Lastpage :
122
Abstract :
Realization of efficient laser diodes with ultra-violet (UV) emission from ∼260–360 nm would enable many applications including fluorescence-based biological agent detection, sterilization, and portable water purification. While InGaN-based laser diodes are well developed down to ∼370 nm, achieving shorter UV wavelengths requires higher Al-content AlGaN alloys with increasing challenges in achieving p-type doping, strain-management, and low threading-dislocation-density (TDD) AlGaN templates. Given these challenges, few groups have reported AlGaN-based edge-emitting laser diodes (LDs) with emission < 355 nm.[1, 2] Most recently, random lasing via Anderson localization in AlGaN nanowire structures has demonstrated a novel approach to realizing deep-UV laser diodes.[3]
Keywords :
Aluminum gallium nitride; Diode lasers; Gallium nitride; Laboratories; Optical waveguides; Wide band gap semiconductors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Summer Topicals Meeting Series (SUM), 2015
Conference_Location :
Nassau, Bahamas
Print_ISBN :
978-1-4799-7467-2
Type :
conf
DOI :
10.1109/PHOSST.2015.7248224
Filename :
7248224
Link To Document :
بازگشت