DocumentCode :
2129915
Title :
An electrical probe for measuring thermal expansion coefficients of micromachined polysilicon thin films
Author :
Liu, Hai-Yun ; Huang, Qing-An ; Li, Wei-Hua
Author_Institution :
Key Lab. of MEMS of Minist. of Educ., Southeast Univ., Nanjing, China
fYear :
2010
fDate :
1-4 Nov. 2010
Firstpage :
2538
Lastpage :
2542
Abstract :
In this paper, we present a novel electrical test structure for determining the thermal expansion coefficients (TECs) of micromachined polysilicon thin films. The electrothermal properties of the test structure are analyzed. The pull-in method is exploited in characterizing TECs of thin films. In addition, an analytical model and a measurement method are developed. The finite element software ANSYS is used to support the electrothermal analytical model. The test structure is fabricated using standard surface micromachining technology, and it is characterized under the natural operation environment. Measured average value of TEC is 2.48 × 10-6 K-1 from 300 K to 364.8K.
Keywords :
elemental semiconductors; finite element analysis; micromachining; probes; semiconductor thin films; silicon; thermal expansion measurement; ANSYS software; TEC measurement; electrical probe; electrical test structure; electrothermal analytical model; finite element software; micromachined polysilicon thin film; thermal expansion coefficient measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Sensors, 2010 IEEE
Conference_Location :
Kona, HI
ISSN :
1930-0395
Print_ISBN :
978-1-4244-8170-5
Electronic_ISBN :
1930-0395
Type :
conf
DOI :
10.1109/ICSENS.2010.5690482
Filename :
5690482
Link To Document :
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