DocumentCode
2130121
Title
Resolution Enhancement in High Numerical Aperture Optical System
Author
Zhan, Qiufang ; Gao, Xiumin ; Li, Jinsong ; Zhuang, Songlin
Author_Institution
China Stand. Software Co., Ltd., Shanghai, China
fYear
2009
fDate
17-19 Oct. 2009
Firstpage
1
Lastpage
5
Abstract
Resolution enhancement requirement occurs in many optical systems, such as in imaging system, optical microscopy domain, optical lithography, and optical data storage. Some enhancement techniques are proposed, including higher numerical aperture (NA) and ring illumination. In this article, the resolution enhancement in high numerical aperture optical system is investigated by vector optics theory. It was found that the vector characteristics of the incident beam in high numerical aperture optical system affects resolution enhancement effect remarkably, and may weaken resolution enhancement effect for some cases, namely, the focus does not always decrease with increasing numerical aperture, in addition, the full width half maximum (FWHM) of focal spot differs for different direction for high numerical aperture and ring illumination, which means the resolution enhancement effect differs in different direction. Therefore, resolution enhancement of higher NA and ring illumination should be taken care of in practice use.
Keywords
image enhancement; image resolution; optical images; high numerical aperture optical system; optical data storage; optical lithography; optical microscopy; resolution enhancement effect; ring illumination; vector optics theory; Apertures; Educational institutions; High-resolution imaging; Image resolution; Lighting; Lithography; Optical diffraction; Optical filters; Optical imaging; Optical microscopy;
fLanguage
English
Publisher
ieee
Conference_Titel
Image and Signal Processing, 2009. CISP '09. 2nd International Congress on
Conference_Location
Tianjin
Print_ISBN
978-1-4244-4129-7
Electronic_ISBN
978-1-4244-4131-0
Type
conf
DOI
10.1109/CISP.2009.5303156
Filename
5303156
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