Micromachined silicon radiation sensors - Part 2: Fabrication technologies

Author

Bagolini, A. ; Boscardin, M. ; Conci, P. ; Crivellari, M. ; Giacomini, G. ; Mattedi, F. ; Piemonte, C. ; Ronchin, S. ; Zorzi, N. ; Benkechkache, M.A. ; Dalla Betta, G.-F. ; Mendicino, R. ; Pancheri, L. ; Povoli, M. ; Sultan, D.M.S.

Author_Institution

Center for Mater. & Microsyst., FBK (Kessler Found. for Res.), Trento, Italy

fYear

2015

fDate

3-5 Feb. 2015

Firstpage

1

Lastpage

4

Abstract

The aim of this work is to present the main technological developments carried out at FBK for micro machined radiation sensors used in High Energy Physics (HEP) experiments. We report on the main technological issues to integrate silicon etching (wet and dry) techniques in the fabrication flow for silicon detector and we show some examples of innovative detectors realized by means of these technologies.

Keywords

elemental semiconductors; micromachining; micromechanical devices; nuclear electronics; passivation; silicon; silicon radiation detectors; sputter etching; FBK; HEP; Si; fabrication flow; fabrication technologies; high energy physics; micromachined silicon radiation sensors; silicon detector; silicon etching techniques; Detectors; Etching; Image edge detection; Neutrons; Silicon; Three-dimensional displays; DRIE; High Energy Physics; Micromachining; silicon detectors;

fLanguage

English

Publisher

ieee

Conference_Titel

AISEM Annual Conference, 2015 XVIII

Conference_Location

Trento

Type

conf

DOI

10.1109/AISEM.2015.7066822

Filename

7066822