DocumentCode
2131115
Title
A novel Pt-Ti-O gate Si-metal-insulator-semiconductor field-effect transistor hydrogen gas sensor
Author
Usagawa, Toshiyuki ; Kikuchi, Yota
Author_Institution
Adv. Res. Lab., Hitachi, Ltd., Saitama, Japan
fYear
2010
fDate
1-4 Nov. 2010
Firstpage
2145
Lastpage
2148
Abstract
A novel hydrogen gas sensor based on platinum titanium-oxygen (Pt-Ti-O) gate silicon-metal-insulator semiconductor field-effect transistors (Si-MISFETs) was developed. The sensor has a unique gate structure composed of titanium and oxygen accumulated around platinum grains on top of a novel mixed layer of nanocrystalline TiOx and super heavily oxygen-doped amorphous titanium formed on SiO2/Si substrates. The FET hydrogen sensors show long life times more than ten years as intrinsic chip life time by accelerated temperature aging test, and high sensing amplitude (ΔVg), which is well fitted by a linear function of the logarithm of air-diluted hydrogen concentration C(ppm), i.e., ΔVg(V)=0.355Log C(ppm)-0.610, between 100 ppm and 1%. The gradient of 0.355V/decade at 115°C is about ten times higher than that of Pt gate Si-MOSFETs hydrogen sensors. The threshold Voltage (Vth) of FETs is reproducible, and shows excellent uniformity over the 5-inch wafers, 3σVth of 178 mV.
Keywords
MISFET; gas sensors; hydrogen; platinum; silicon compounds; titanium; H2; MISFET; Pt-Ti-O-SiO2-Si; hydrogen gas sensor; long life time; silicon-metal-insulator semiconductor field-effect transistors; unique gate structure; voltage 178 mV;
fLanguage
English
Publisher
ieee
Conference_Titel
Sensors, 2010 IEEE
Conference_Location
Kona, HI
ISSN
1930-0395
Print_ISBN
978-1-4244-8170-5
Electronic_ISBN
1930-0395
Type
conf
DOI
10.1109/ICSENS.2010.5690525
Filename
5690525
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