Title :
Zero offset drift suppression in SiC pressure sensors at 600 °C
Author :
Okojie, Robert S. ; Blaha, Charles ; Lukco, Dorothy ; Nguyen, Vu ; Savrun, Ender
Author_Institution :
NASA Glenn Res. Center, Cleveland, OH, USA
Abstract :
Temporal drifts in zero pressure offset voltage, Voz, observed in piezoresistive silicon carbide (SiC) pressure sensors at 600 °C were significantly suppressed to allow reliable operation. By modifying the bondpad/contact metallization, the Vη relative drift velocity at 600 °C was suppressed to within ± 0.5 mV.hr-1, for over 1000 hours. Microstructural changes within the contact metallization were analyzed with Auger Electron Spectroscopy (AES) and Scanning Electron Microscopy (SEM). This metallization scheme may improve SiC pressure sensor reliability in short duration ground/flight tests and lower temperature (~300 °C) remote pressure monitoring (i.e., geothermal, and deep well drilling).
Keywords :
Auger electron spectroscopy; contact resistance; metallisation; piezoresistive devices; pressure sensors; remote sensing; scanning electron microscopy; silicon compounds; wide band gap semiconductors; Auger electron spectroscopy; SEM; SiC; bondpad/contact metallization; deep well drilling; geothermal pressure monitoring; piezoresistive pressure sensors; remote pressure monitoring; scanning electron microscopy; temperature 600 C; zero offset drift suppression;
Conference_Titel :
Sensors, 2010 IEEE
Conference_Location :
Kona, HI
Print_ISBN :
978-1-4244-8170-5
Electronic_ISBN :
1930-0395
DOI :
10.1109/ICSENS.2010.5690714