• DocumentCode
    2136682
  • Title

    TUNNETT Operation Mode in Silicon

  • Author

    Jorke, H. ; Kahmen, G. ; Luy, J.F.

  • Author_Institution
    Daimler Benz Research Center Ulm, Wilhelm-Runge Str. 11, 89081 Ulm. e-mail: helmut.jorke@dbag.ulm.daimlerbenz.com
  • Volume
    2
  • fYear
    1997
  • fDate
    8-12 Sept. 1997
  • Firstpage
    1035
  • Lastpage
    1040
  • Abstract
    Using DC and RF characterization techniques the transition from impact avalanche transit time (IMPATT) to tunnel injection transit time (TUNNETT) operation is investigated by varying the width of the generation zone in p-type lo-hi-lo (p LHL) structures. DC results show, that the doping height of the hi zone is a very crucial parameter, where tolerances become the narrower the smaller the generation zone width gets. The smallest widths realized amount to few ten nanometers. In this range still significant avalanche multiplication is present (M > 1000). S-parameter measurements, on the other hand, reveal a low impedance level which is more typical to in-phase injection TUNNEIT than to IMPATT operation. Preliminary RF results regarding output power and noise performance are 10 dBm (f = 78 GHz) and ¿84 dBc/Hz at 1 MHz offset frequency, respectively.
  • Keywords
    CMOS technology; Capacitance-voltage characteristics; Diodes; Doping; Fabrication; Millimeter wave technology; Radio frequency; Silicon; Tunneling; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Conference, 1997. 27th European
  • Conference_Location
    Jerusalem, Israel
  • Type

    conf

  • DOI
    10.1109/EUMA.1997.337933
  • Filename
    4138985