Title :
Fractal study for describing surface morphology from atomic forge microscopy images
Author :
Flueraru, C. ; Nastase, S. ; Iovan, S.
Author_Institution :
Nat. Res. & Dev. Inst. for Microtechnol., Bucharest, Romania
Abstract :
Roughness profiles of various polysilicon surface were measured by atomic force microscopy. These profiles are analysed using fractal theory to illustrate the advantage of treating surface morphology from the fractal point of view
Keywords :
atomic force microscopy; elemental semiconductors; fractals; silicon; surface topography; Si; atomic forge microscopy image; fractal theory; polysilicon surface; roughness profile; surface morphology; Atomic force microscopy; Atomic measurements; Force measurement; Fractals; Frequency; Rough surfaces; Surface morphology; Surface roughness; Surface topography; Surface treatment;
Conference_Titel :
Semiconductor Conference, 1997. CAS '97 Proceedings., 1997 International
Conference_Location :
Sinaia
Print_ISBN :
0-7803-3804-9
DOI :
10.1109/SMICND.1997.651318
