DocumentCode
2138473
Title
Fractal study for describing surface morphology from atomic forge microscopy images
Author
Flueraru, C. ; Nastase, S. ; Iovan, S.
Author_Institution
Nat. Res. & Dev. Inst. for Microtechnol., Bucharest, Romania
Volume
2
fYear
1997
fDate
7-11 Oct 1997
Firstpage
557
Abstract
Roughness profiles of various polysilicon surface were measured by atomic force microscopy. These profiles are analysed using fractal theory to illustrate the advantage of treating surface morphology from the fractal point of view
Keywords
atomic force microscopy; elemental semiconductors; fractals; silicon; surface topography; Si; atomic forge microscopy image; fractal theory; polysilicon surface; roughness profile; surface morphology; Atomic force microscopy; Atomic measurements; Force measurement; Fractals; Frequency; Rough surfaces; Surface morphology; Surface roughness; Surface topography; Surface treatment;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Conference, 1997. CAS '97 Proceedings., 1997 International
Conference_Location
Sinaia
Print_ISBN
0-7803-3804-9
Type
conf
DOI
10.1109/SMICND.1997.651318
Filename
651318
Link To Document