Title :
Printed organic electronics with a high k nanocomposite dielectric gate insulator
Author :
Rasul, Amjad ; Zhang, Jie ; Gamota, Dan ; Takoudis, Christos
Author_Institution :
Phys. Realization Res. Center, Motorola Inc., Schaumburg, IL
Abstract :
High capacitance, solution processed nanocomposite dielectric material was demonstrated as a gate insulator for printed electronics applications. A nanocomposite consisting of cross-linked propylene glycol methyl ether acetate and barium titanate (BTO) nanoparticles was developed and utilized as the gate insulator. The high relative permittivity (K=35), bimodal nanocomposite utilized had two different filler particle sizes 200 nm and 1000 nm diameter particles. Bottom contact organic field effect transistors (OFETs) were demonstrated using a combination of printing and spray coating technologies. A metal coated plastic film was used as the flexible gate substrate. An amorphous organic semiconductor was utilized as the active layer. OFETs with the solution processed nanocomposite dielectric had a high field-induced current and a low threshold voltage and thus a low operating voltage due to the high capacitance gate insulator. In this paper, we review the characteristics of the nanocomposite material and discuss the processing and performance of the printed organic devices
Keywords :
amorphous semiconductors; barium compounds; high-k dielectric thin films; insulated gate field effect transistors; nanocomposites; organic semiconductors; spray coatings; 1 micron; 200 nm; amorphous organic semiconductor; barium titanate nanoparticles; bimodal nanocomposite; flexible gate substrate; gate insulator; high-k dielectric material; nanocomposite dielectric material; organic field effect transistors; particle sizes; plastic film; printed electronics; printed organic devices; printed organic electronics; printing technology; propylene glycol methyl ether acetate; spray coating; Capacitance; Dielectric materials; Dielectric substrates; Dielectrics and electrical insulation; High K dielectric materials; High-K gate dielectrics; Nanostructured materials; OFETs; Organic electronics; Threshold voltage;
Conference_Titel :
Electronic Components and Technology Conference, 2006. Proceedings. 56th
Conference_Location :
San Diego, CA
Print_ISBN :
1-4244-0152-6
DOI :
10.1109/ECTC.2006.1645642