DocumentCode :
2141546
Title :
Low dissipation nanoscale transistor physics and operations
Author :
Chi On Chui ; Shih, Kun-Huan ; Shoorideh, Kaveh
Author_Institution :
Electr. Eng. Dept., Univ. of California, Los Angeles, CA, USA
fYear :
2008
fDate :
20-23 Oct. 2008
Firstpage :
29
Lastpage :
32
Abstract :
Power dissipation has recently overtaken performance as the most important challenge in scaling nanoscale transistors. In this paper, we have proposed and preliminarily analyzed novel device concepts to reduce both the off-state leakage dissipation as well as the dynamic power consumption. The off-state leakage can be selectively suppressed using a wide bandgap drain heterojunction architecture. On the other hand, the dynamic power can be reduced using an asymmetric gate biasing scheme. We have also discussed the enabling device physics and operating principles.
Keywords :
MOSFET; nanoelectronics; semiconductor heterojunctions; asymmetric gate biasing; dynamic power consumption; low dissipation nanoscale transistor; off-state leakage dissipation; power dissipation; wide bandgap drain heterojunction; Electron traps; MOSFET circuits; Medical simulation; Photonic band gap; Physics; Power dissipation; Semiconductor device doping; Substrates; Thermal management; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-2185-5
Electronic_ISBN :
978-1-4244-2186-2
Type :
conf
DOI :
10.1109/ICSICT.2008.4734468
Filename :
4734468
Link To Document :
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