DocumentCode
2141645
Title
An experimental study on carrier transport in silicon nanowire transistors: How close to the ballistic limit?
Author
Wang, Runsheng ; Jing Zhuge ; Huang, Ru ; Zhang, Liangliang ; Kim, Dong-Won ; Zhang, Xing ; Park, Donggun ; Wang, Yangyuan
Author_Institution
Inst. of Microelectron., Peking Univ., Beijing, China
fYear
2008
fDate
20-23 Oct. 2008
Firstpage
46
Lastpage
49
Abstract
In this paper, experimental studies on the carrier transport in silicon nanowire transistors (SNWTs) are reported, demonstrating their great potential as an alternative device structure for near-ballistic transport from top-down approach. Both ballistic efficiency and apparent mobility were characterized. A modified experimental extraction methodology for SNWTs is proposed, which takes into account the impact of quantum contact resistance. The highest ballistic efficiency is observed in sub-40 nm n-channel SNWTs due to their quasi-1D carrier transport. The apparent mobility is also extracted in comparison with the ballistic limit, which indicates that the gate-all-around SNWT can really be considered as a promising device architecture in close proximity to the ballistic transport.
Keywords
ballistic transport; contact resistance; elemental semiconductors; nanoelectronics; nanowires; silicon; transistors; Si; ballistic efficiency; ballistic limit; near-ballistic transport; quantum contact resistance; quasi1D carrier transport; silicon nanowire transistors; top-down approach; Backscatter; Ballistic transport; CMOS technology; Capacitive sensors; Contact resistance; MOS devices; MOSFETs; Nanoscale devices; Silicon; Temperature dependence;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
Conference_Location
Beijing
Print_ISBN
978-1-4244-2185-5
Electronic_ISBN
978-1-4244-2186-2
Type
conf
DOI
10.1109/ICSICT.2008.4734473
Filename
4734473
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