Title :
A comprehensive study on Schottky barrier nanowire transistors (SB-NWTs): Principle, physical limits and parameter fluctuations
Author :
Zhang, Liangliang ; Kang, Zhaoyi ; Wang, Runsheng ; Huang, Ru
Author_Institution :
Key Lab. of Microelectron. Devices & Circuits, Peking Univ., Peking, China
Abstract :
P-type Schottky barrier nanowire transistors (p-SB-NWTs) are computational studied in this paper. We analyzed the working principle and physical limits on their performance in details. The impact of Schottky contact of SB-NWTs on the current drivability, gate control and RF performance are studied comparing with conventional silicon nanowire transistors (SNWTs). It is pointed out that the inferior performance of SB-NWTs can not be solved by changing the S/D or channel materials. On the other hand, small Vt, Ft and on-off ratio fluctuation caused by process variation on channel diameter are observed, which is an advantage of SB-NWTs.
Keywords :
CMOS integrated circuits; MOSFET; Schottky barriers; fluctuations; nanowires; semiconductor device models; 3-D device simulation; MOSFETs; channel diameter; conventional silicon nanowire transistors; current drivability; gate control; on-off ratio fluctuation; p-type Schottky barrier nanowire transistors; CMOS technology; Contact resistance; Fluctuations; MOSFETs; Microelectronics; Nanoscale devices; Schottky barriers; Silicides; Silicon; Tunneling;
Conference_Titel :
Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-2185-5
Electronic_ISBN :
978-1-4244-2186-2
DOI :
10.1109/ICSICT.2008.4734495