DocumentCode
2142798
Title
Secondary electron emission characteristic of nanocrystalline diamond films
Author
Li Kai ; Jin Xiao ; Gan Kong-yin ; Wang Han-bin ; Hu He-ping
Author_Institution
Inst. of Appl. Electron., Mianyang, China
fYear
2008
fDate
6-11 July 2008
Firstpage
1
Lastpage
3
Abstract
The preparation, characterization and application of nanocrystalline diamond films have become a new “hot point” in the development of diamond films prepared by chemical vapor deposition. In this paper, we simply introduced the preparation process of nano-crystalline diamond films with MPCVD method, and the result of surface analysis. Then we designed an experiment device to measure the SEE coefficient(δ) in emission mode. A good result (δ =15) has been obtained.
Keywords
diamond; nanofabrication; nanostructured materials; plasma CVD; secondary electron emission; surface structure; thin films; C; emission mode; nanocrystalline diamond films; plasma enhanced chemical vapor deposition; secondary electron emission; surface analysis; Energy measurement; Gases; Laser modes; Measurement by laser beam; Microwave theory and techniques; US Department of Defense;
fLanguage
English
Publisher
ieee
Conference_Titel
High Power Particle Beams (BEAMS), 2008 17th International Conference on
Conference_Location
Xian
Type
conf
Filename
6202941
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