DocumentCode :
2142798
Title :
Secondary electron emission characteristic of nanocrystalline diamond films
Author :
Li Kai ; Jin Xiao ; Gan Kong-yin ; Wang Han-bin ; Hu He-ping
Author_Institution :
Inst. of Appl. Electron., Mianyang, China
fYear :
2008
fDate :
6-11 July 2008
Firstpage :
1
Lastpage :
3
Abstract :
The preparation, characterization and application of nanocrystalline diamond films have become a new “hot point” in the development of diamond films prepared by chemical vapor deposition. In this paper, we simply introduced the preparation process of nano-crystalline diamond films with MPCVD method, and the result of surface analysis. Then we designed an experiment device to measure the SEE coefficient(δ) in emission mode. A good result (δ =15) has been obtained.
Keywords :
diamond; nanofabrication; nanostructured materials; plasma CVD; secondary electron emission; surface structure; thin films; C; emission mode; nanocrystalline diamond films; plasma enhanced chemical vapor deposition; secondary electron emission; surface analysis; Energy measurement; Gases; Laser modes; Measurement by laser beam; Microwave theory and techniques; US Department of Defense;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
High Power Particle Beams (BEAMS), 2008 17th International Conference on
Conference_Location :
Xian
Type :
conf
Filename :
6202941
Link To Document :
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