DocumentCode
2142968
Title
Self-consistent modeling of higher pressure Microwave PACVD reactors
Author
Meierbachtol, Collin S. ; Grotjohn, Timothy A. ; Shanker, Balasubramaniam
Author_Institution
Dept. of Electr. & Comput. Eng., Michigan State Univ., East Lansing, MI, USA
fYear
2012
fDate
8-14 July 2012
Firstpage
1
Lastpage
2
Abstract
Self-consistent simulation of Microwave PACVD reactors at higher pressures is challenging as it involves coupling many different physical phenomena that are highly nonlinear. This paper presents a solution for these problems. Two major components of the simulation include a finite-difference frequency domain (FDFD) electromagnetic model, and a steady-state convective plasma flow model. These two components are run concurrently while converging toward a single, self-consistent solution. To our knowledge, this is the first model to describe in detail the various physical, chemical, and thermal processes occurring during Microwave PACVD diamond film growth at higher pressures (up to 40% atmosphere). Detailed results and comparisons with experimental data will be presented at the conference.
Keywords
chemical reactors; convection; finite difference methods; frequency-domain analysis; high-pressure techniques; plasma CVD; plasma flow; thin films; C; FDFD electromagnetic model; chemical processing; finite-difference frequency domain electromagnetic model; higher pressure microwave PACVD reactor; microwave PACVD diamond film growth; physical processing; self-consistent modeling; steady-state convective plasma flow model; thermal processing; Diamond-like carbon; Electromagnetic modeling; Hydrogen; Inductors; Mathematical model; Physics; Plasmas;
fLanguage
English
Publisher
ieee
Conference_Titel
Antennas and Propagation Society International Symposium (APSURSI), 2012 IEEE
Conference_Location
Chicago, IL
ISSN
1522-3965
Print_ISBN
978-1-4673-0461-0
Type
conf
DOI
10.1109/APS.2012.6348638
Filename
6348638
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