DocumentCode
2143594
Title
Stochastic degradation modeling and simulation for analog integrated circuits in nanometer CMOS
Author
Gielen, Georges ; Maricau, Elie
Author_Institution
Department of Electrical Engineering - ESAT, Katholieke Universiteit Leuven, Belgium
fYear
2013
fDate
18-22 March 2013
Firstpage
326
Lastpage
331
Abstract
Reliability is one of the major concerns in designing integrated circuits in nanometer CMOS technologies. Problems related to transistor degradation mechanisms like NBTI/PBTI or soft gate breakdown cause time-dependent circuit performance degradation. Variability and mismatch between transistors only makes this more severe, while at the same time transistor aging can increase the variability and mismatch in the circuit over time. Finally, in advanced nanometer CMOS, the aging phenomena themselves become discrete, with both the time and the impact of degradation being fully stochastic. This paper explores these problems by means of a circuit example, indicating the time-dependent stochastic nature of offset in a comparator and its impact in flash A/D converters.
Keywords
Aging; Degradation; Integrated circuit modeling; Reliability; Stochastic processes; Stress; Transistors; aging; analog integrated circuits; reliability modeling and simulation;
fLanguage
English
Publisher
ieee
Conference_Titel
Design, Automation & Test in Europe Conference & Exhibition (DATE), 2013
Conference_Location
Grenoble, France
ISSN
1530-1591
Print_ISBN
978-1-4673-5071-6
Type
conf
DOI
10.7873/DATE.2013.078
Filename
6513524
Link To Document