DocumentCode :
2143594
Title :
Stochastic degradation modeling and simulation for analog integrated circuits in nanometer CMOS
Author :
Gielen, Georges ; Maricau, Elie
Author_Institution :
Department of Electrical Engineering - ESAT, Katholieke Universiteit Leuven, Belgium
fYear :
2013
fDate :
18-22 March 2013
Firstpage :
326
Lastpage :
331
Abstract :
Reliability is one of the major concerns in designing integrated circuits in nanometer CMOS technologies. Problems related to transistor degradation mechanisms like NBTI/PBTI or soft gate breakdown cause time-dependent circuit performance degradation. Variability and mismatch between transistors only makes this more severe, while at the same time transistor aging can increase the variability and mismatch in the circuit over time. Finally, in advanced nanometer CMOS, the aging phenomena themselves become discrete, with both the time and the impact of degradation being fully stochastic. This paper explores these problems by means of a circuit example, indicating the time-dependent stochastic nature of offset in a comparator and its impact in flash A/D converters.
Keywords :
Aging; Degradation; Integrated circuit modeling; Reliability; Stochastic processes; Stress; Transistors; aging; analog integrated circuits; reliability modeling and simulation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design, Automation & Test in Europe Conference & Exhibition (DATE), 2013
Conference_Location :
Grenoble, France
ISSN :
1530-1591
Print_ISBN :
978-1-4673-5071-6
Type :
conf
DOI :
10.7873/DATE.2013.078
Filename :
6513524
Link To Document :
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