• DocumentCode
    2143594
  • Title

    Stochastic degradation modeling and simulation for analog integrated circuits in nanometer CMOS

  • Author

    Gielen, Georges ; Maricau, Elie

  • Author_Institution
    Department of Electrical Engineering - ESAT, Katholieke Universiteit Leuven, Belgium
  • fYear
    2013
  • fDate
    18-22 March 2013
  • Firstpage
    326
  • Lastpage
    331
  • Abstract
    Reliability is one of the major concerns in designing integrated circuits in nanometer CMOS technologies. Problems related to transistor degradation mechanisms like NBTI/PBTI or soft gate breakdown cause time-dependent circuit performance degradation. Variability and mismatch between transistors only makes this more severe, while at the same time transistor aging can increase the variability and mismatch in the circuit over time. Finally, in advanced nanometer CMOS, the aging phenomena themselves become discrete, with both the time and the impact of degradation being fully stochastic. This paper explores these problems by means of a circuit example, indicating the time-dependent stochastic nature of offset in a comparator and its impact in flash A/D converters.
  • Keywords
    Aging; Degradation; Integrated circuit modeling; Reliability; Stochastic processes; Stress; Transistors; aging; analog integrated circuits; reliability modeling and simulation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Design, Automation & Test in Europe Conference & Exhibition (DATE), 2013
  • Conference_Location
    Grenoble, France
  • ISSN
    1530-1591
  • Print_ISBN
    978-1-4673-5071-6
  • Type

    conf

  • DOI
    10.7873/DATE.2013.078
  • Filename
    6513524