DocumentCode :
2144970
Title :
Small geometry effects in n- and p-channel polysilicon thin film transistors
Author :
Lewis, A.G. ; Wu, I.-W. ; Huang, T.Y. ; Koyanagi, M. ; Chiang, A. ; Bruce, R.H.
Author_Institution :
Xerox Palo Alto Res. Center, CA, USA
fYear :
1988
fDate :
11-14 Dec. 1988
Firstpage :
260
Lastpage :
263
Abstract :
The authors describe the results of an experimental study of small-geometry effects in n- and p-channel polysilicon TFTs (thin film transistors) fabricated on quartz substrates. Short-channel effects are shown to be severe, with significant threshold shifts observed in devices with gate lengths of less than about 8 mu m and degradation in drain breakdown voltages for gate lengths below about 5 mu m. The performance of simple digital CMOS circuits fabricated using TFTs with a range of gate lengths is also reported, and the improvement in speed achieved by reducing gate lengths is shown. In particular, the operation of shift registers, designed using 5- mu m-long TFTs at clock frequencies in excess of 50 MHz, is demonstrated.<>
Keywords :
CMOS integrated circuits; digital integrated circuits; elemental semiconductors; silicon; thin film transistors; 5 to 8 micron; 50 MHz; SiO/sub 2/ substrates; TFTs; clock frequencies; degradation in drain breakdown voltages; digital CMOS circuits; gate lengths; polycrystalline Si; quartz substrates; semiconductors; shift registers; small-geometry effects; thin film transistors; threshold shifts; CMOS digital integrated circuits; Degradation; Flat panel displays; Geometry; Laboratories; Shift registers; Substrates; Thin film transistors; Threshold voltage; Transconductance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1988. IEDM '88. Technical Digest., International
Conference_Location :
San Francisco, CA, USA
ISSN :
0163-1918
Type :
conf
DOI :
10.1109/IEDM.1988.32806
Filename :
32806
Link To Document :
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