DocumentCode
2145798
Title
Computer simulation of influence of the ionization processes on dynamics of formation of electronic beams in plasma sources of the charged particles
Author
Petrovich, O.N. ; Stekolnikov, A.F. ; Gruzdev, V.A.
fYear
2002
fDate
2002
Firstpage
404
Lastpage
406
Abstract
The elevated working pressure is an advantage of plasma emitters of electrons. At such a range of working pressure of plasma sources of electrons to neglect shock ionization of molecules of residual gas by beam electrons, and, hence, ion space charge in a gap of acceleration is impossible. Other distinctive feature of plasma sources of electrons are that the geometry and position of emitting surface of the plasma are not invariable given that the edge of emitting plasma settles down in those points of the gap in acceleration, where zero intensity of an electric field is established. Ionization processes in an acceleration gap of electron-optical systems with the plasma emitter and mobility of emitting surface of plasma result in change of distribution of potential in accelerating gap, in change of position and configuration of a plasma surface, that sets a trajectory of beam electrons, and, hence, influences formation and characteristics of an electron beam. A calculation algorithm of electron-optical systems with the plasma emitter at the elevated working pressure is developed. The developed algorithm was fixed in a basis of the programs created for numerical simulation of dynamics of conditions of formation of narrow and tubular electron beams.
Keywords
digital simulation; electron beams; electron optics; electron sources; ionisation; physics computing; plasma sources; acceleration gap; beam electrons; charged particle plasma sources; computer simulation; electron beams formation; electron-optical systems; elevated working pressure; emitting surface geometry; emitting surface position; ion space charge; ionization processes; narrow electron beams; numerical simulation; plasma emitting surface mobility; residual gas; tubular electron beams; Acceleration; Computer simulation; Electron beams; Electron emission; Ionization; Particle beams; Plasma accelerators; Plasma properties; Plasma simulation; Plasma sources;
fLanguage
English
Publisher
ieee
Conference_Titel
Discharges and Electrical Insulation in Vacuum, 2002. 20th International Symposium on
Print_ISBN
0-7803-7394-4
Type
conf
DOI
10.1109/ISDEIV.2002.1027394
Filename
1027394
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