DocumentCode
2145877
Title
Low-K wire bonding
Author
Kim, Yoon-joo ; Kim, Joon-soo ; Chung, Ji-young ; Na, Seok-ho ; Kim, Jin-young ; Kim, Seok-bong
Author_Institution
Amkor Technol. Inc., Seoul
fYear
0
fDate
0-0 0
Abstract
When we encountered the bond pad metal peeling defects with low-K devices during wire bonding, we have a tendency to optimize ´bonding power´, ´bonding force´ and ´bond time´ so far. But the effectiveness of improvement by evaluations was not so satisfactory as much as we have got with normal Si devices. So this brought us to assume existence of another important factors against the defects and initial force and bonding force were revealed to play an important role in the defects through DOE (design of experiments) implementation. As the results of DOE and some more evaluations, the defects could be reduced by squashing initial balls (free air balls) using the initial force and bonding force before bonding starts or at the very beginning of bonding because the stress onto the bond pads through balls during wire bonding can be distributed and lessened as much as the squashed area. And when the initial force is larger than the bonding force, it was more effective to reduce the defects
Keywords
design of experiments; dielectric materials; joining materials; lead bonding; bond pad metal peeling defects; bond time; bonding force; bonding power; design of experiments; free air balls; wire bonding; Bonding forces; Dielectric materials; Dielectrics and electrical insulation; Inorganic materials; Organic materials; Plastic insulation; Semiconductor materials; US Department of Energy; Wafer bonding; Wire;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference, 2006. Proceedings. 56th
Conference_Location
San Diego, CA
ISSN
0569-5503
Print_ISBN
1-4244-0152-6
Type
conf
DOI
10.1109/ECTC.2006.1645873
Filename
1645873
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