• DocumentCode
    2146505
  • Title

    High efficiency silicon visible light emitter using silicon nanocrystals in silicon nitride matrix and transparent doping layer

  • Author

    Sung, Gun Yong ; Park, Nae-Man ; Kim, Tae-Youb ; Kim, Kyung-Hyun ; Cho, Kwan Sik ; Shin, Jae Heon

  • Author_Institution
    Future Technol. Res. Div., ETRI, Daejeon, South Korea
  • fYear
    2005
  • fDate
    21-23 Sept. 2005
  • Firstpage
    51
  • Lastpage
    53
  • Abstract
    Semiconductor electronics is strongly dominated by silicon technology. However silicon technology does not allow easy integration with optical component since silicon is a poor light emitter. The unique properties of Si nanocrystals (nc-Si) can be exploited to fabricate Si-based light source. We will introduce a quantum confinement effect in the nc-Si embedded in a silicon nitride formed by PECVD. The band gap of the nc-Si could be controlled from 1.38 to 3.02 eV by decreasing the nanocrystal size. In addition, we will demonstrate a silicon light emitter with a transparent doping layer on nc-Si embedded in silicon nitride active layer by using ITO and n-type wide bandgap semiconducting layer. This light emitter has high external quantum efficiency of 1.6%, which is the highest value ever reported in Si-based visible light emitters.
  • Keywords
    elemental semiconductors; energy gap; indium compounds; integrated optics; integrated optoelectronics; light emitting devices; light sources; nanostructured materials; semiconductor doping; silicon; silicon compounds; transparency; wide band gap semiconductors; 1.38 to 3.02 eV; ITO; ITO layer; InSnO; PECVD; Si; Si-based light source; SiN; band gap; external quantum efficiency; high efficiency light emitter; n-type wide bandgap semiconducting layer; nanocrystal size; quantum confinement effect; semiconductor electronics; silicon light emitter; silicon nanocrystals; silicon nitride matrix; silicon technology; transparent doping layer; visible light emitter; Indium tin oxide; Light emitting diodes; Light sources; Nanocrystals; Optical devices; Photonic band gap; Potential well; Semiconductor device doping; Silicon; Size control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Group IV Photonics, 2005. 2nd IEEE International Conference on
  • Print_ISBN
    0-7803-9070-9
  • Type

    conf

  • DOI
    10.1109/GROUP4.2005.1516400
  • Filename
    1516400