DocumentCode :
2146553
Title :
Characterization of Micromachined Coplanar Waveguides on Silicon up to 300 GHz
Author :
Sahri, N. ; Nagatsuma, T. ; Machida, K. ; Ishii, H. ; Kyuragi, H.
Author_Institution :
NTT Telecommunications Energy Laboratories, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa, 243-0198 Japan. Phone: +81-462-40-2295, Fax: +81-462-40-4041, E-mail: sahri@aecl.ntt.co.jp
Volume :
1
fYear :
1999
fDate :
Oct. 1999
Firstpage :
254
Lastpage :
257
Abstract :
We report the design, fabrication and characterization of a novel micromachined coplanar waveguide on high-resistivity silicon for millimeter-wave applications up to 300 GHz. Its high frequency characteristics are achieved using 10-¿m deep V-grooves and thick and abrupt sidewalls metallization of up to 10 ¿m. We present the loss and dispersion results up to 300 GHz measured using a time domain technique and compare them to those of coplanar waveguides on other important millimeter wave substrates.
Keywords :
Coplanar waveguides; Dispersion; Frequency; Loss measurement; Metallization; Millimeter wave measurements; Millimeter wave technology; Optical device fabrication; Silicon; Time measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Conference, 1999. 29th European
Conference_Location :
Munich, Germany
Type :
conf
DOI :
10.1109/EUMA.1999.338321
Filename :
4139416
Link To Document :
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