DocumentCode :
2146976
Title :
Excellent resistive switching characteristics of Cu doped ZrO2 and its 64 bit cross-point integration
Author :
Liu, Ming ; Guan, Weihua ; Long, Shibing ; Liu, Qi ; Wang, Wei
Author_Institution :
Lab. of Nanofabrication & Novel Device Integration, Chinese Acad. of Sci., Beijing, China
fYear :
2008
fDate :
20-23 Oct. 2008
Firstpage :
905
Lastpage :
908
Abstract :
Excellent nonpolar resistive switching behavior is reported in the Cu doped ZrO2 memory devices with the sandwiched structure of Cu/ZrO2:Cu/Pt. The ratio between the high and low resistance is in the order of 106. Set and Reset operation in voltage pulse mode can be as fast as 50 ns and 100 ns, respectively. Multilevel storage is considered feasible due to the dependence of ON-state resistance on Set compliance current. The switching mechanism is demonstrated to be related with the formation and rupture of Cu conductive bridge. Based on this working cell, 64 bit cross-point array is fabricated and tested.
Keywords :
MIM devices; copper; doping; platinum; random-access storage; sandwich structures; zirconium compounds; Cu-ZrO2:Cu-Pt; ON-state resistance; cross-point array; cross-point integration; memory devices; metal-insulator-metal structure; multilevel storage; nonpolar resistive switching; reset operation; resistive random access memory; sandwiched structure; set compliance current; set operation; storage capacity 64 bit; voltage pulse mode; Bridge circuits; CMOS technology; Educational institutions; Electrodes; Gold; Microelectronics; Nonvolatile memory; Protection; Temperature; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-2185-5
Electronic_ISBN :
978-1-4244-2186-2
Type :
conf
DOI :
10.1109/ICSICT.2008.4734692
Filename :
4734692
Link To Document :
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