Optically controlled frequency selective surface for millimeter-wave applications

Author

Su, Hansheng ; Yang, Bin ; Liu, Xiaoming ; Li, Daohui ; Chen, Xiaodong ; Donnan, Robert ; Parini, Clive ; Kreouzis, Theo

Author_Institution

Queen Mary, Univ. of London, London, UK

fYear

2012

fDate

8-14 July 2012

Firstpage

1

Lastpage

2

Abstract

In this paper, an optically controlled millimeter-wave frequency selective surface using high resistivity silicon as tunable substrate is designed and tested. It is shown from measured results, the transmission performance of FSS at resonant frequency is tuned from -1.02dB to -16dB by light illumination. The photoconductive characteristic of silicon in millimeter wave region is studied. It is shown from the measured results that the insertion loss of silicon at 110GHz is 0.0005dB without light illumination. However, its transmission coefficient decreases to -25dB at 110GHz and -45dB at 320GHz under 500mW IR light illumination.

Keywords

frequency selective surfaces; millimetre wave devices; silicon; IR light illumination; Si; frequency 110 GHz; frequency 320 GHz; loss 0.0005 dB; millimeter-wave applications; optically controlled frequency selective surface; power 500 mW; resonant frequency; silicon; Adaptive optics; Frequency selective surfaces; Lighting; Millimeter wave measurements; Millimeter wave technology; Optical control; Silicon;

fLanguage

English

Publisher

ieee

Conference_Titel

Antennas and Propagation Society International Symposium (APSURSI), 2012 IEEE

Conference_Location

Chicago, IL

ISSN

1522-3965

Print_ISBN

978-1-4673-0461-0

Type

conf

DOI

10.1109/APS.2012.6348814

Filename

6348814