DocumentCode :
2147402
Title :
Optimization of charge pumping technique in polysilicon TFTs for geometric effect elimination and trap state density extraction
Author :
Lu, Lei ; Wang, Mingxiang ; Wong, Man
Author_Institution :
Dept. of Microelectron., Soochow Univ., Suzhou, China
fYear :
2008
fDate :
20-23 Oct. 2008
Firstpage :
978
Lastpage :
981
Abstract :
Charge pumping (CP) technique is optimized to minimize the geometric component in the CP current in polysilicon TFTs, by taking into account the pulse waveform and its transition times. Based on the optimization, ideal CP curves similar to those in MOSFETs are obtained. Important information on the trap state density of polysilicon TFTs, i.e., the mean value as well as the energy distribution within the band-gap, can be reliably extracted in different ways.
Keywords :
optimisation; silicon; thin film transistors; CP current; band-gap; charge pumping technique; energy distribution; geometric effect elimination; optimization; polysilicon TFT; pulse waveform transition time; trap state density extraction; Charge pumps; Crystallization; Data mining; Electron traps; MOSFETs; Microelectronics; Photonic band gap; Pulse measurements; Spontaneous emission; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-2185-5
Electronic_ISBN :
978-1-4244-2186-2
Type :
conf
DOI :
10.1109/ICSICT.2008.4734707
Filename :
4734707
Link To Document :
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