DocumentCode :
2147458
Title :
Noise Characteristics of 0.5 μm/50 GHz Si and 0.5 μm/70 GHz SiGe Bipolar Technologies
Author :
Aufinger, K. ; Knapp, H. ; Gabl, R. ; Meister, T.F. ; Böck, J. ; Schäfer, H. ; Pohl, M. ; Treitinger, L.
Author_Institution :
Infineon Technologies AG, Corporate Research, Otto-Hahn-Ring 6, D-81730 Munich, Germany. email: Klaus.Aufinger@infineon.com
Volume :
2
fYear :
1999
fDate :
4-6 Oct. 1999
Firstpage :
129
Lastpage :
132
Abstract :
This paper presents the noise characteristics of 0.5 μm / 50 GHz Si [8] and 0.5 μm / 70 GHz SiGe [5] bipolar transistors. High-frequency (HF) noise characteristics are shown and compared. Observed similarities and differences are discussed. Low-frequency (LF) noise characteristics are used to extract LF noise model parameters. The corresponding noise sources are included in SpectreRF and the model is applied to simulate oscillator noise characteristics. Comparisons with experimental results are shown which demonstrate the usefulness of the approach for optimization of phase noise.
Keywords :
Bipolar transistors; Cutoff frequency; Germanium silicon alloys; Integrated circuit noise; Low-frequency noise; Noise figure; Oscillators; Phase noise; Semiconductor process modeling; Silicon germanium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Conference, 1999. 29th European
Conference_Location :
Munich, Germany
Type :
conf
DOI :
10.1109/EUMA.1999.338427
Filename :
4139456
Link To Document :
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