DocumentCode
2150599
Title
High-Q resonators using FBAR/SAW technology and their applications
Author
Ueda, Makoto ; Nishihara, Tokihiro ; Tsutsumi, J. ; Taniguchi, Shinji ; Yokoyama, Tomoki ; Inoue, Shingo ; Miyashita, Tadakazu ; Satoh, Y.
Author_Institution
Fujitsu Labs. Ltd., Akashi, Japan
fYear
2005
fDate
12-17 June 2005
Abstract
This paper describes FBAR and SAW resonators which have high-Q factor using unique technology, and their applications. A new electrode material suitable for AlN-based FBARs have been developed in order to realize high-Q factor for low loss. The necessary conditions for FBAR electrode materials are low resistivity and high acoustic impedance. It is found the properties of ruthenium (Ru) to be suitable for use as electrode materials for AlN-based FBARs. The resonant characteristics of FBAR using Ru electrodes indicates Qr of 1200 and an effective electromechanical coupling coefficient k2 of 6.7% at 2 GHz. On the contrary, SAW resonator with narrow finger electrode, which can suppress transverse leakage of SAW , shows Qr of 670 and k2of 7.1%. Furthermore, we applied these resonators to ladder-type FBAR filter for 2-GHz WCDMA and SAW duplexer for US-PCS, respectively, and achieved low-loss and step cut-off filters as a result.
Keywords
III-V semiconductors; Q-factor; acoustic impedance; aluminium compounds; bulk acoustic wave devices; electrodes; piezoelectric thin films; ruthenium; surface acoustic wave resonators; 2 GHz; AlN; FBAR resonators; Q factor; Ru; SAW duplexer; SAW resonators; US PCS; WCDMA; acoustic impedance; electrode material; resistivity; Acoustic materials; Conductivity; Electrodes; Film bulk acoustic resonators; Fingers; Impedance; Multiaccess communication; Resonance; Resonator filters; Surface acoustic waves;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave Symposium Digest, 2005 IEEE MTT-S International
ISSN
01490-645X
Print_ISBN
0-7803-8845-3
Type
conf
DOI
10.1109/MWSYM.2005.1516561
Filename
1516561
Link To Document