Title :
Co-integration of resonant-tunneling and single-barrier hot-electron transistors operating at 300 K
Author :
Moise, T.S. ; Kao, Y.C. ; Seabaugh, A.C. ; Taddiken, A.H.
Author_Institution :
Corp. Res. & Dev., Texas Instrum. Inc., Dallas, TX, USA
Abstract :
We have co-integrated a tunneling hot-electron transfer amplifier (THETA) and a novel resonant-tunneling hot-electron transfer amplifier (RTHETA) within a single epitaxial growth. At room temperature, the THETA exhibits a peak common-emitter current gain of greater than 6. The RTHETA exhibits similar common-emitter current gain along with negative transconductance characteristics associated with the resonant-tunneling effect. In contrast to the resonant-tunneling hot-electron transistor (RHET), the RTHETA exhibits current gain both before and after the resonant peak voltage. From on-wafer S-parameter measurements, the current-gain cut-off frequency (fT) and the maximum frequency of oscillation (fmax) for both transistors are approximately 20 GHz and 9 GHz, respectively
Keywords :
S-parameters; bipolar transistors; hot electron transistors; microwave measurement; molecular beam epitaxial growth; resonant tunnelling devices; semiconductor epitaxial layers; semiconductor growth; solid-state microwave devices; 20 GHz; 300 K; 9 GHz; MBE; RTHETA; S-parameter measurements; THETA; current-gain cut-off frequency; epitaxial growth; maximum frequency of oscillation; negative transconductance characteristics; peak common-emitter current gain; resonant peak voltage; resonant-tunneling hot-electron transfer amplifier; resonant-tunneling hot-electron transistors; single-barrier hot-electron transistors; tunneling hot-electron transfer amplifier; Current measurement; Cutoff frequency; Epitaxial growth; Frequency measurement; Resonance; Resonant tunneling devices; Scattering parameters; Temperature; Transconductance; Voltage;
Conference_Titel :
Indium Phosphide and Related Materials, 1994. Conference Proceedings., Sixth International Conference on
Conference_Location :
Santa Barbara, CA
Print_ISBN :
0-7803-1476-X
DOI :
10.1109/ICIPRM.1994.328299