DocumentCode
2151135
Title
Very high density RF MIM capacitor compatible with VLSI
Author
Chiang, K.C. ; Lai, Cara H. ; Chin, Alvin ; Kao, H.L. ; McAlister, S.P. ; Chi, C.C.
Author_Institution
Nano Sci. Tech. Center, Nat. Chiao-Tung Univ., Hsinchu, Taiwan
fYear
2005
fDate
12-17 June 2005
Abstract
We have fabricated RF MIM capacitors, using high-k TiTaO as the dielectric, which show a record high density of 20 fF/μm2. In addition, the capacitors display a small capacitance reduction of only 3.6% over the 100 kHz to 20 GHz range, a low leakage current of 8 pA and a high Q of 120. This was for a typical large 8 pF TiTaO MIM capacitor. The small voltage dependence of the capacitance (ΔC/C) of 770 ppm at 2 GHz, shows that these MIM capacitors are useful for high-precision RF circuits.
Keywords
MIM devices; VLSI; capacitors; microwave integrated circuits; titanium compounds; 2 GHz; 8 pA; 8 pF; RF MIM capacitor; RF circuits; TiTaO; VLSI; capacitance reduction; dielectric materials; leakage current; Capacitance; Circuits; Displays; High K dielectric materials; High-K gate dielectrics; Leakage current; MIM capacitors; Radio frequency; Very large scale integration; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave Symposium Digest, 2005 IEEE MTT-S International
ISSN
01490-645X
Print_ISBN
0-7803-8845-3
Type
conf
DOI
10.1109/MWSYM.2005.1516582
Filename
1516582
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