DocumentCode
2151288
Title
A poly-Si gate carbon nanotube field effect transistor for high frequency applications
Author
Sunkook Kim ; Tae-Young Choi ; Moonsub Shim ; Mohammadi, Saeed
Author_Institution
Sch. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN, USA
fYear
2005
fDate
12-17 June 2005
Abstract
We are reporting a novel carbon nanotube field effect transistor with a poly-Si bottom gate structure. The device has a gate length of 3μm and achieves a unity gain frequency fT of 2.5GHz and a maximum oscillation frequency fmax of >5GHz. The high frequency performance of the device is attributed to the ballistic transport of electrons inside the nanotube and is expected to improve by reducing the gate length.
Keywords
UHF field effect transistors; ballistic transport; carbon nanotubes; nanotechnology; silicon; 2.5 GHz; 3 micron; Si; carbon nanotube field effect transistor; electron ballistic transport; gate length; high frequency applications; high frequency performance; maximum oscillation frequency; nanotechnology; poly-Si gate; poly-silicon; unity gain frequency; Application software; CNTFETs; Carbon nanotubes; Chemicals; FETs; Frequency measurement; Nanobioscience; Nanoscale devices; Radio frequency; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave Symposium Digest, 2005 IEEE MTT-S International
ISSN
01490-645X
Print_ISBN
0-7803-8845-3
Type
conf
DOI
10.1109/MWSYM.2005.1516586
Filename
1516586
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