Title :
150 W GaN-on-Si RF power transistor
Author :
Nagy, W. ; Singhal, Sharad ; Borges, Ricardo ; Johnson, Jerry Wayne ; Brown, J. David ; Therrien, R. ; Chaudhari, A. ; Hanson, A.W. ; Riddle, Joel ; Booth, Stephen ; Rajagopal, P. ; Piner, E.L. ; Linthicum, K.J.
Author_Institution :
Nitronex Corp., Raleigh, NC, USA
Abstract :
A large periphery high power AlGaN/GaN HFET grown on a silicon substrate has demonstrated over 150 W of CW RF output power along with excellent drain efficiency of 65%. When operated under WCDMA modulation and 28 Vdc drain supply voltage, these devices produced 20 W of RF output power with a corresponding drain efficiency of 27% while achieving an adjacent channel power ratio (ACPR) of -39 dBc. A 36 mm device was tested in a DPD linearizer under multi-carrier WCDMA modulation and achieved 20 dB of linearity improvement with 35% drain efficiency. Lastly, device reliability data is presented and shows extrapolated 20 year drift estimates of less than 1 dB for Psat.
Keywords :
III-V semiconductors; UHF field effect transistors; aluminium compounds; code division multiple access; gallium compounds; power HEMT; semiconductor device reliability; silicon; 150 W; 20 W; 27 percent; 28 V; 35 percent; 36 mm; 65 percent; AlGaN-GaN-Si; DPD linearizer; HFET device; RF power transistors; adjacent channel power ratio; device reliability; high electron mobility transistors; multi-carrier WCDMA modulation; Aluminum gallium nitride; Gallium nitride; HEMTs; MODFETs; Multiaccess communication; Power generation; Power transistors; Radio frequency; Silicon; Voltage;
Conference_Titel :
Microwave Symposium Digest, 2005 IEEE MTT-S International
Print_ISBN :
0-7803-8845-3
DOI :
10.1109/MWSYM.2005.1516635