• DocumentCode
    2154098
  • Title

    Complementary bipolar processes on bonded SOI

  • Author

    Feindt, S. ; Lapham, J. ; Steigerwals, J.

  • Author_Institution
    Analog Devices Inc., Wilmington, MA, USA
  • fYear
    1997
  • fDate
    6-9 Oct 1997
  • Firstpage
    4
  • Lastpage
    6
  • Abstract
    Bipolar transistors are well suited to analog circuits due to their exponential properties and their ability to drive capacitive loads. Analog Devices´ first complementary bipolar (CB) process used junction isolation. During the development phase of the second generation CB process it was decided that we employ bonded wafers with trenches to achieve full dielectric isolation. That process has been running in production since 1992 and has more than 100 products being built on it. Subsequent generations of CB processes at Analog have continued to use this isolation approach. In this paper we discuss the merits of using bonded SOI versus standard junction isolation for our processes. We describe the processes and their performance, as well as the challenges encountered in the development of the processes due to the incorporation of bonded wafer starting material
  • Keywords
    bipolar analogue integrated circuits; isolation technology; silicon-on-insulator; wafer bonding; Analog Devices; Si; analog circuits; bonded SOI wafers; complementary bipolar processes; dielectric isolation; junction isolation; self heating; trenches; Capacitance; Capacitors; Dielectric substrates; Dielectric thin films; Implants; MOSFETs; Resistors; Transistors; Voltage; Wafer bonding;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SOI Conference, 1997. Proceedings., 1997 IEEE International
  • Conference_Location
    Fish Camp, CA
  • ISSN
    1078-621X
  • Print_ISBN
    0-7803-3938-X
  • Type

    conf

  • DOI
    10.1109/SOI.1997.634905
  • Filename
    634905