DocumentCode :
2154954
Title :
MCT (MOS controlled thyristor) reliability investigation
Author :
Temple, V.A.K. ; Arthur, S. ; Watrous, D.L.
Author_Institution :
General Electric Corp., Schenectady, NY, USA
fYear :
1988
fDate :
11-14 Dec. 1988
Firstpage :
618
Lastpage :
621
Abstract :
The authors outline some of the ruggedness features observed in recent MCTs. The MCT capabilities described cover the last stages of tests performed on devices that were production-line fabricated and aimed at 400 to 1600 V blocking levels but small enough in die size to be packaged in a TO-220 or TO-218 plastic package. The goal of 100-A operation, a 1-V forward drop at 20 A, and a 1- mu s turn-off time has been achieved in 0.2 to 0.4 cm/sup 2/ production-line-fabricated MCTs. The high-current ruggedness, including di/dt, is due to low forward drop plus uniform MOS-gated turn-on. Turn-off current ruggedness is the result of small cell size and the fact that the MCT blocking junction is flat. High-temperature capability along with excellent noise capability and virtually zero Miller gate capacitance are due to the very dense off-FET shorts and the low (<1 V) FET source-drain voltage and off-FET average current.<>
Keywords :
insulated gate field effect transistors; reliability; thyristors; 1 V; 1 mus; 100 A; 20 A; 400 to 1600 V; FET source-drain voltage; MCTs; MOS controlled thyristor; TO-218 plastic package; TO-220 plastic package; capabilities; dense off-FET shorts; di/dt; flat blocking junction; high-current ruggedness; low forward drop; noise capability; off-FET average current; production-line fabricated; reliability investigation; ruggedness features; small cell size; turn off current ruggedness; turn-off time; uniform MOS-gated turn-on; virtually zero Miller gate capacitance; Equivalent circuits; FETs; MOSFETs; Plastic packaging; Production; Rivers; Temperature; Testing; Thyristors; Turning;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1988. IEDM '88. Technical Digest., International
Conference_Location :
San Francisco, CA, USA
ISSN :
0163-1918
Type :
conf
DOI :
10.1109/IEDM.1988.32890
Filename :
32890
Link To Document :
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