Title :
Probing of Cu presence at Ta-SiO2 interfaces by second harmonic generation measurement
Author :
Tey, S.H. ; Seebauer, E.G. ; Prasad, K. ; Tee, K.C. ; Chan, L.H.
Author_Institution :
Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore
Abstract :
In this paper, we have demonstrated for the first time that optical second harmonic generation (SHG) measurement can be used to probe Cu presence at the Ta-SiO2 interfaces. We report here the details of our experimental procedures and investigation results. This technique shows tremendous potential in surface and interface microanalysis for Cu presence at these regions.
Keywords :
chemical interdiffusion; copper; high-speed optical techniques; interface structure; measurement by laser beam; metal-insulator boundaries; optical harmonic generation; silicon compounds; tantalum; Cu; Cu presence; Ta-SiO2; Ta-SiO2 interfaces; interface microanalysis; second harmonic generation measurement; surface microanalysis; Atom optics; Atomic measurements; Chemical technology; Frequency conversion; Mass spectroscopy; Nonlinear optics; Optical harmonic generation; Optical polarization; Optical sensors; Probes;
Conference_Titel :
Optoelectronic and Microelectronic Materials and Devices, 2002 Conference on
Print_ISBN :
0-7803-7571-8
DOI :
10.1109/COMMAD.2002.1237305
