DocumentCode :
2156162
Title :
Variable MEMS-based inductors fabricated from PECVD silicon nitride
Author :
Dell, J.M. ; Winchester, K. ; Musca, C.A. ; Antoszewski, J. ; Faraone, L.
Author_Institution :
Sch. of Electr., Electron. & Comput. Eng., Western Australia Univ., Crawley, WA, Australia
fYear :
2002
fDate :
11-13 Dec. 2002
Firstpage :
567
Lastpage :
570
Abstract :
This paper presents the implementation of inductors for on-chip integration with RF electronics. The inductors were fabricated using silicon bulk micromachining to form a micro-electro-mechanical system (MEMS) that is free from eddy-current losses found in spiral inductors formed using conventional silicon processing. By using the fabrication approach developed here, the resulting inductors are electrically tunable with the application of low DC bias voltages.
Keywords :
inductors; micromachining; micromechanical devices; plasma CVD; silicon compounds; PECVD silicon nitride; RF electronics; SiN; micro-electro-mechanical system; on-chip integration; silicon bulk micromachining; variable MEMS-based inductors; Consumer electronics; Costs; Fabrication; Inductors; Micromechanical devices; Photonics; Radio frequency; Silicon; Space technology; Spirals;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optoelectronic and Microelectronic Materials and Devices, 2002 Conference on
ISSN :
1097-2137
Print_ISBN :
0-7803-7571-8
Type :
conf
DOI :
10.1109/COMMAD.2002.1237315
Filename :
1237315
Link To Document :
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