DocumentCode :
2156206
Title :
High voltage pullup devices in a BiMOS HVIC technology
Author :
Scott, R.S. ; Pattanayak, D.N. ; Kohl, J.E. ; Adler, M.S. ; Ahle, R.S. ; Wildi, E.J.
Author_Institution :
Gen. Electr. Co., Schenectady, NY, USA
fYear :
1988
fDate :
11-14 Dec. 1988
Firstpage :
800
Lastpage :
803
Abstract :
High-voltage complementary pullup and pulldown devices have been fabricated in a high-voltage integrated circuit process that is based on thin epitaxial layers (<10 mu m). The device structures described allow high-voltage pullup devices to be realized where normally only pulldown devices would be possible in such thin epitaxial layers. Only one additional mask was needed to incorporate these devices into the existing junction-isolated BiMOS technology. A 400-V chip featuring in high-voltage, low-power consumption drivers along with 5-V CMOS logic has been fabricated using novel depletion-mode NMOS design.<>
Keywords :
BIMOS integrated circuits; integrated circuit technology; power integrated circuits; 10 micron; 400 V; 5-V CMOS logic; BiMOS HVIC technology; HV chip; depletion-mode NMOS design; high-voltage integrated circuit process; high-voltage pullup devices; low-power consumption drivers; thin epitaxial layers; Avalanche breakdown; Driver circuits; Epitaxial layers; Integrated circuit technology; Isolation technology; MOS devices; Research and development; Substrates; Switches; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1988. IEDM '88. Technical Digest., International
Conference_Location :
San Francisco, CA, USA
ISSN :
0163-1918
Type :
conf
DOI :
10.1109/IEDM.1988.32932
Filename :
32932
Link To Document :
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