Title :
Fabrication of high aspect ratio photonic crystal structures in lithium niobate
Author :
Hartung, H. ; Kley, E.-B. ; Tünnermann, A. ; Gischkat, T. ; Schrempel, F.
Author_Institution :
Friedrich Schiller Univ. Jena, Jena
Abstract :
This article presents the ion beam etching technology for photonic crystal structures in lithium niobate. This new fabrication technique is able to create sub micrometer size elements in lithium niobate with a depth of up to 500 nm.
Keywords :
etching; integrated optics; lithium compounds; optical fabrication; photonic crystals; LiNbO3; depth 500 nm; high aspect ratio structures; ion beam etching; lithium niobate; optical fabrication; photonic crystal; submicrometer size elements; Amorphous materials; Crystalline materials; Crystallization; Etching; Ion beams; Lithium niobate; Optical device fabrication; Photonic crystals; Physics; Solid state circuits;
Conference_Titel :
Lasers and Electro-Optics, 2007 and the International Quantum Electronics Conference. CLEOE-IQEC 2007. European Conference on
Conference_Location :
Munich
Print_ISBN :
978-1-4244-0931-0
Electronic_ISBN :
978-1-4244-0931-0
DOI :
10.1109/CLEOE-IQEC.2007.4386206
