• DocumentCode
    2156423
  • Title

    Gate slow transients in GaAs MESFETs-causes, cures, and impact on circuits

  • Author

    Yeats, R. ; D´Avanzo, D.C. ; Chan, K. ; Fernandez, N. ; Taylor, T.W. ; Vogel, C.

  • Author_Institution
    Hewlett-Packard, Santa Rosa, CA, USA
  • fYear
    1988
  • fDate
    11-14 Dec. 1988
  • Firstpage
    842
  • Lastpage
    845
  • Abstract
    Gate slow transient (or gate lag) in GaAs MESFETs were investigated and found to be responsible for pulse narrowing and loss of transmitted pulses in long inverter chains. Gate transients are caused by surface states near the edges of the gate. Gate transients can be drastically reduced in recessed gate MESFETs by controlling the gate trough geometry so that gates fit tightly in the bottom of the trough. Doping level and passivation also affect gate lag, although they are of less importance than trough geometry. Isolation technique and subchannel material structure do not strongly affect gate lag. Dispersion of FET output conductance is also found to be independent of gate lag.<>
  • Keywords
    III-V semiconductors; Schottky gate field effect transistors; gallium arsenide; transients; GaAs; III-V semiconductors; MESFETs; doping level; gate lag; gate slow transients; gate trough geometry; inverter chains; isolation technique; output conductance dispersion; passivation; pulse narrowing; recessed gate; subchannel material structure; surface states; transmitted pulse loss; Conducting materials; Doping; FETs; Gallium arsenide; Geometry; MESFET circuits; Passivation; Propagation losses; Pulse inverters; Surface fitting;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1988. IEDM '88. Technical Digest., International
  • Conference_Location
    San Francisco, CA, USA
  • ISSN
    0163-1918
  • Type

    conf

  • DOI
    10.1109/IEDM.1988.32942
  • Filename
    32942