DocumentCode :
2156423
Title :
Gate slow transients in GaAs MESFETs-causes, cures, and impact on circuits
Author :
Yeats, R. ; D´Avanzo, D.C. ; Chan, K. ; Fernandez, N. ; Taylor, T.W. ; Vogel, C.
Author_Institution :
Hewlett-Packard, Santa Rosa, CA, USA
fYear :
1988
fDate :
11-14 Dec. 1988
Firstpage :
842
Lastpage :
845
Abstract :
Gate slow transient (or gate lag) in GaAs MESFETs were investigated and found to be responsible for pulse narrowing and loss of transmitted pulses in long inverter chains. Gate transients are caused by surface states near the edges of the gate. Gate transients can be drastically reduced in recessed gate MESFETs by controlling the gate trough geometry so that gates fit tightly in the bottom of the trough. Doping level and passivation also affect gate lag, although they are of less importance than trough geometry. Isolation technique and subchannel material structure do not strongly affect gate lag. Dispersion of FET output conductance is also found to be independent of gate lag.<>
Keywords :
III-V semiconductors; Schottky gate field effect transistors; gallium arsenide; transients; GaAs; III-V semiconductors; MESFETs; doping level; gate lag; gate slow transients; gate trough geometry; inverter chains; isolation technique; output conductance dispersion; passivation; pulse narrowing; recessed gate; subchannel material structure; surface states; transmitted pulse loss; Conducting materials; Doping; FETs; Gallium arsenide; Geometry; MESFET circuits; Passivation; Propagation losses; Pulse inverters; Surface fitting;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1988. IEDM '88. Technical Digest., International
Conference_Location :
San Francisco, CA, USA
ISSN :
0163-1918
Type :
conf
DOI :
10.1109/IEDM.1988.32942
Filename :
32942
Link To Document :
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