Title :
DFB laser array with first order gratings fabricated by X-ray lithography
Author :
Nakao, M. ; Sato, K. ; Nishida, T. ; Tamamura, T. ; Ozawa, A. ; Saito, Y. ; Okada, I. ; Yoshihara, H.
Author_Institution :
LSI Lab., NTT, Atsugi, Japan
Abstract :
X-ray lithography was used to fabricate a first-order grating with a lambda /4 phase shift for a DFB (distributed feedback) laser array. The grating fabrication process is shown. Pulsed operation results are shown for a ridge-type laser array, which was designed with 7.5-A wavelength variation from laser to laser and a spacing of 125 mu m.<>
Keywords :
X-ray lithography; diffraction gratings; distributed feedback lasers; integrated optics; optical workshop techniques; semiconductor junction lasers; 125 micron; DFB laser array; X-ray lithography; distributed feedback; first order gratings; grating fabrication process; lambda /4 phase shift; ridge-type; semiconductor lasers; Distributed feedback devices; Gratings; Laser feedback; Optical arrays; Optical design; Optical device fabrication; Optical pulses; Phased arrays; X-ray lasers; X-ray lithography;
Conference_Titel :
Electron Devices Meeting, 1988. IEDM '88. Technical Digest., International
Conference_Location :
San Francisco, CA, USA
DOI :
10.1109/IEDM.1988.32953
