DocumentCode :
2157554
Title :
Low-cost fabrication of millimeter-wave all-silicon high efficiency antenna
Author :
Basha, Mohamed Ali ; Abdellatif, Ahmed ; Safavi-Naeini, Safieddin
Author_Institution :
Center for Sensor Networks & Cellular Syst. (SNCS), Univ. of Tabuk, Tabuk, Saudi Arabia
fYear :
2012
fDate :
8-14 July 2012
Firstpage :
1
Lastpage :
2
Abstract :
A fabrication process of high-efficiency low-cost all silicon antenna at the millimeter wave range of frequency is presented. The antenna fabrication is a multi-level deep reactive ion etching process of a high resistivity intrinsic silicon wafer. The new process provides a silicon-platform for integrated planar antenna. A fabricated antenna with two level of Si was tested at 77GHz with an efficiency of 91% using the proposed fabrication process.
Keywords :
elemental semiconductors; millimetre wave antennas; planar antennas; silicon; sputter etching; Si; antenna fabrication process; frequency 77 GHz; high-resistivity intrinsic silicon wafer; integrated planar antenna; low-cost fabrication; millimeter wave all-silicon high-efficiency antenna; multilevel deep-reactive ion etching process; Antennas; Conductivity; Dielectrics; Educational institutions; Etching; Fabrication; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Antennas and Propagation Society International Symposium (APSURSI), 2012 IEEE
Conference_Location :
Chicago, IL
ISSN :
1522-3965
Print_ISBN :
978-1-4673-0461-0
Type :
conf
DOI :
10.1109/APS.2012.6349172
Filename :
6349172
Link To Document :
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