DocumentCode :
2161244
Title :
Fabrication of Si/SiO2 Bragg reflectors by low energy multiple SIMOX
Author :
Ishikawa, Yukari ; Shibata, N. ; Fukatsu, S.
Author_Institution :
Japan Fine Ceramics Center, Nagoya, Japan
fYear :
1997
fDate :
6-9 Oct 1997
Firstpage :
58
Lastpage :
59
Abstract :
We report successful fabrication of SIMOX-based epitaxial Bragg reflectors (BRs) to demonstrate the yet-to-be-explored potential of current SIMOX technology for conceivable optical applications
Keywords :
SIMOX; integrated optics; ion implantation; molecular beam epitaxial growth; optical fabrication; Si MBE; Si-SiO2; Si/SiO2 Bragg reflector; epitaxial growth; fabrication; low energy multiple SIMOX; optical device; Epitaxial growth; Lattices; Microcavities; Optical device fabrication; Reflectivity; Stacking; Substrates; Surface emitting lasers; Surface morphology; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SOI Conference, 1997. Proceedings., 1997 IEEE International
Conference_Location :
Fish Camp, CA
ISSN :
1078-621X
Print_ISBN :
0-7803-3938-X
Type :
conf
DOI :
10.1109/SOI.1997.634931
Filename :
634931
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2161244
بازگشت