• DocumentCode
    2161244
  • Title

    Fabrication of Si/SiO2 Bragg reflectors by low energy multiple SIMOX

  • Author

    Ishikawa, Yukari ; Shibata, N. ; Fukatsu, S.

  • Author_Institution
    Japan Fine Ceramics Center, Nagoya, Japan
  • fYear
    1997
  • fDate
    6-9 Oct 1997
  • Firstpage
    58
  • Lastpage
    59
  • Abstract
    We report successful fabrication of SIMOX-based epitaxial Bragg reflectors (BRs) to demonstrate the yet-to-be-explored potential of current SIMOX technology for conceivable optical applications
  • Keywords
    SIMOX; integrated optics; ion implantation; molecular beam epitaxial growth; optical fabrication; Si MBE; Si-SiO2; Si/SiO2 Bragg reflector; epitaxial growth; fabrication; low energy multiple SIMOX; optical device; Epitaxial growth; Lattices; Microcavities; Optical device fabrication; Reflectivity; Stacking; Substrates; Surface emitting lasers; Surface morphology; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SOI Conference, 1997. Proceedings., 1997 IEEE International
  • Conference_Location
    Fish Camp, CA
  • ISSN
    1078-621X
  • Print_ISBN
    0-7803-3938-X
  • Type

    conf

  • DOI
    10.1109/SOI.1997.634931
  • Filename
    634931
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2161244