DocumentCode :
2161258
Title :
3D EM Characterization of Wafer Probes
Author :
Ding, Hanyi ; Wolf, Randy ; Ferrario, John
Author_Institution :
IBM Microelectronics, 1000 River St., Essex Junction, VT 05452, USA. hanyi@us.ibm.com
fYear :
2001
fDate :
24-26 Sept. 2001
Firstpage :
1
Lastpage :
4
Abstract :
The following paper describes a method to characterize wafer probes using a 3D EM simulator. Rather than following the traditional method of building a custom test fixture for different probe setups and measuring the S-parameters, this 3D EM characterization method yields multi-port S-parameters of a specific probe structure by utilizing simulations. For a standard characterization, the S-parameters can be a four-port S-parameter matrix for two selected probe pins. This matrix can be used directly by many RF design tools for design and analysis, and can be used to extract the equivalent circuit models of probes (if needed). An agreement has been obtained between data from the 3D EM characterization and the traditional method. In contrast to traditional methods, the 3D EM characterization method provides a fast and flexible technique to obtain an RF model of probes.
Keywords :
Buildings; Circuit simulation; Data mining; Equivalent circuits; Fixtures; Pins; Probes; Radio frequency; Scattering parameters; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Conference, 2001. 31st European
Conference_Location :
London, England
Type :
conf
DOI :
10.1109/EUMA.2001.338945
Filename :
4140013
Link To Document :
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