DocumentCode :
2161482
Title :
Scaling guideline of DRAM memory cells for maintaining the retention time
Author :
Ueno, S. ; Inoue, Y. ; Inuishi, M.
Author_Institution :
ULSI Dev. Center, Mitsubishi Electr. Corp., Hyogo, Japan
fYear :
2000
fDate :
13-15 June 2000
Firstpage :
84
Lastpage :
85
Abstract :
We propose the model of junction leakage current of local cells. Our model can well explain voltage, temperature dependence and distribution of the leakage current. This model indicates that interface state is considered to control the leakage current and retention time. Based on our model, we found that decreasing the trap density and the electric field are effective for decreasing the leakage current. Moreover, a guideline of trap density, storage capacitance and electric field is proposed for designing future DRAMs to maintain the retention time.
Keywords :
DRAM chips; interface states; leakage currents; DRAM memory cell; device scaling; electric field; interface states; junction leakage current; retention time; storage capacitance; temperature dependence; trap density; Guidelines; Interface states; Leakage current; Probability distribution; Random access memory; System testing; Tail; Temperature dependence; Tunneling; Ultra large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, 2000. Digest of Technical Papers. 2000 Symposium on
Conference_Location :
Honolulu, HI, USA
Print_ISBN :
0-7803-6305-1
Type :
conf
DOI :
10.1109/VLSIT.2000.852779
Filename :
852779
Link To Document :
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