DocumentCode
2161482
Title
Scaling guideline of DRAM memory cells for maintaining the retention time
Author
Ueno, S. ; Inoue, Y. ; Inuishi, M.
Author_Institution
ULSI Dev. Center, Mitsubishi Electr. Corp., Hyogo, Japan
fYear
2000
fDate
13-15 June 2000
Firstpage
84
Lastpage
85
Abstract
We propose the model of junction leakage current of local cells. Our model can well explain voltage, temperature dependence and distribution of the leakage current. This model indicates that interface state is considered to control the leakage current and retention time. Based on our model, we found that decreasing the trap density and the electric field are effective for decreasing the leakage current. Moreover, a guideline of trap density, storage capacitance and electric field is proposed for designing future DRAMs to maintain the retention time.
Keywords
DRAM chips; interface states; leakage currents; DRAM memory cell; device scaling; electric field; interface states; junction leakage current; retention time; storage capacitance; temperature dependence; trap density; Guidelines; Interface states; Leakage current; Probability distribution; Random access memory; System testing; Tail; Temperature dependence; Tunneling; Ultra large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 2000. Digest of Technical Papers. 2000 Symposium on
Conference_Location
Honolulu, HI, USA
Print_ISBN
0-7803-6305-1
Type
conf
DOI
10.1109/VLSIT.2000.852779
Filename
852779
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