• DocumentCode
    2161482
  • Title

    Scaling guideline of DRAM memory cells for maintaining the retention time

  • Author

    Ueno, S. ; Inoue, Y. ; Inuishi, M.

  • Author_Institution
    ULSI Dev. Center, Mitsubishi Electr. Corp., Hyogo, Japan
  • fYear
    2000
  • fDate
    13-15 June 2000
  • Firstpage
    84
  • Lastpage
    85
  • Abstract
    We propose the model of junction leakage current of local cells. Our model can well explain voltage, temperature dependence and distribution of the leakage current. This model indicates that interface state is considered to control the leakage current and retention time. Based on our model, we found that decreasing the trap density and the electric field are effective for decreasing the leakage current. Moreover, a guideline of trap density, storage capacitance and electric field is proposed for designing future DRAMs to maintain the retention time.
  • Keywords
    DRAM chips; interface states; leakage currents; DRAM memory cell; device scaling; electric field; interface states; junction leakage current; retention time; storage capacitance; temperature dependence; trap density; Guidelines; Interface states; Leakage current; Probability distribution; Random access memory; System testing; Tail; Temperature dependence; Tunneling; Ultra large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 2000. Digest of Technical Papers. 2000 Symposium on
  • Conference_Location
    Honolulu, HI, USA
  • Print_ISBN
    0-7803-6305-1
  • Type

    conf

  • DOI
    10.1109/VLSIT.2000.852779
  • Filename
    852779