DocumentCode :
2162120
Title :
CMOS with active well bias for low-power and RF/analog applications
Author :
Wann, C. ; Harrington, J. ; Mih, R. ; Biesemans, S. ; Han, K. ; Dennard, R. ; Prigge, O. ; Chuan Lin ; Mahnkopf, R. ; Chen, B.
Author_Institution :
IBM Semicond. Res. & Dev. Center, Hopewell Junction, NY, USA
fYear :
2000
fDate :
13-15 June 2000
Firstpage :
158
Lastpage :
159
Abstract :
We show that with a forward body bias, CMOS performance can be improved for those applications which are primarily concerned with speed, and for those which have fixed performance targets but desire lower switching energy (higher MHz/mW). Thus V/sub t/ can be set according to standby power requirement or device design (well and halo engineering), forward body bias is then applied to improve speed or to reduce active power. No compromise in I/sub off/ results if the forward bias is applied when the circuits are active, during which time I/sub off/ and the leakage current are small compared to the switching current. Therefore a low-power CMOS strategy should use a MOSFET as a four-terminal device with a fast top gate and a slow bottom gate shared by a block. Deep-trench isolation with STI provides fine-grain isolation for body bias blocks without area penalty. Making the body available also improves the device analog properties and enables new applications. We present an active-well VCO/mixer as an example.
Keywords :
CMOS analogue integrated circuits; isolation technology; leakage currents; mixers (circuits); power consumption; voltage-controlled oscillators; CMOS; MOSFET; RF/analog application; STI; active power; active well bias; active-well VCO/mixer; body bias blocks; deep-trench isolation; device design; fast top gate; fine-grain isolation; forward body bias; four-terminal device; halo engineering; leakage current; low-power; low-power CMOS strategy; slow bottom gate; speed; standby power requirement; switching current; switching energy; CMOS technology; Capacitance; Delay; Design engineering; Diodes; Guidelines; MOSFET circuits; Power engineering and energy; Radio frequency; Research and development;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, 2000. Digest of Technical Papers. 2000 Symposium on
Conference_Location :
Honolulu, HI, USA
Print_ISBN :
0-7803-6305-1
Type :
conf
DOI :
10.1109/VLSIT.2000.852808
Filename :
852808
Link To Document :
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