DocumentCode :
2163037
Title :
Characterizing silicon waveguides: Local attenuation and distributed reflectivity
Author :
Müller, J. ; Brinkmeyer, E.
Author_Institution :
Tech. Univ. Hamburg-Harburg, Hamburg, Germany
fYear :
2011
fDate :
18-22 Sept. 2011
Firstpage :
1
Lastpage :
3
Abstract :
Characterizing silicon nanophotonic waveguides with regard to local loss and distributed reflectivity, localized return loss, capture fraction, and properties of waveguide tapers is shown to be feasible. Our OFDR-based technique is reliable, fast and nondestructive.
Keywords :
reflectivity; waveguides; OFDR-based technique; capture fraction; distributed reflectivity; localized return loss; silicon nanophotonic waveguides; waveguide tapers; Couplers; Gratings; Optical variables measurement; Optical waveguides; Scattering; Silicon; Spatial resolution;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optical Communication (ECOC), 2011 37th European Conference and Exhibition on
Conference_Location :
Geneva
ISSN :
Pending
Print_ISBN :
978-1-4577-1918-9
Type :
conf
Filename :
6066111
Link To Document :
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