DocumentCode :
2163210
Title :
A microplasma chip for radical monitor
Author :
Sato, Ryota ; Yasumatsu, Daisuke ; Kumagai, Shinya ; Hori, Muneo ; Sasaki, Motoharu
Author_Institution :
Toyota Technol. Inst., Toyota, Japan
fYear :
2013
fDate :
18-22 Aug. 2013
Firstpage :
43
Lastpage :
44
Abstract :
A chip device of generating atmospheric pressure microplasma was fabricated and characterized for light source in a radical monitoring system. The chip consisted of a Si substrate with channels and a lid of MgF2 glass plate with a floating electrode. The chip (20mm × 3mm) generated microplasma of φ200mm under the conditions of 20-40W VHF power and He gas flow of 500sccm. The microplasma emitted clear atomic spectral lines and molecular band spectra, which can be used as a light source in adsorption spectroscopy.
Keywords :
adsorption; electrodes; elemental semiconductors; magnesium compounds; micro-optics; optical fabrication; plasma sources; silicon; Si-MgF2; adsorption spectroscopy; atmospheric pressure microplasma generation; atomic spectral lines; floating electrode; glass plate; helium gas flow; light source; microplasma chip; molecular band spectra; optical fabrication; power 20 W to 40 W; radical monitoring system; silicon substrate; size 20 mm; size 3 mm; Electrodes; Ignition; Monitoring; Optical device fabrication; Plasmas; Silicon; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optical MEMS and Nanophotonics (OMN), 2013 International Conference on
Conference_Location :
Kanazawa
ISSN :
2160-5033
Print_ISBN :
978-1-4799-1512-5
Type :
conf
DOI :
10.1109/OMN.2013.6659050
Filename :
6659050
Link To Document :
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