A microplasma chip for radical monitor

Author

Sato, Ryota ; Yasumatsu, Daisuke ; Kumagai, Shinya ; Hori, Muneo ; Sasaki, Motoharu

Author_Institution

Toyota Technol. Inst., Toyota, Japan

fYear

2013

fDate

18-22 Aug. 2013

Firstpage

43

Lastpage

44

Abstract

A chip device of generating atmospheric pressure microplasma was fabricated and characterized for light source in a radical monitoring system. The chip consisted of a Si substrate with channels and a lid of MgF₂ glass plate with a floating electrode. The chip (20mm × 3mm) generated microplasma of φ200mm under the conditions of 20-40W VHF power and He gas flow of 500sccm. The microplasma emitted clear atomic spectral lines and molecular band spectra, which can be used as a light source in adsorption spectroscopy.

Keywords

adsorption; electrodes; elemental semiconductors; magnesium compounds; micro-optics; optical fabrication; plasma sources; silicon; Si-MgF₂; adsorption spectroscopy; atmospheric pressure microplasma generation; atomic spectral lines; floating electrode; glass plate; helium gas flow; light source; microplasma chip; molecular band spectra; optical fabrication; power 20 W to 40 W; radical monitoring system; silicon substrate; size 20 mm; size 3 mm; Electrodes; Ignition; Monitoring; Optical device fabrication; Plasmas; Silicon; Substrates;

fLanguage

English

Publisher

ieee

Conference_Titel

Optical MEMS and Nanophotonics (OMN), 2013 International Conference on

Conference_Location

Kanazawa

ISSN

2160-5033

Print_ISBN

978-1-4799-1512-5

Type

conf

DOI

10.1109/OMN.2013.6659050

Filename

6659050