• DocumentCode
    2164187
  • Title

    Business Process and Business Rule Modeling: A Representational Analysis

  • Author

    Muehlen, Michael Zur ; Indulska, Marta ; Kamp, Gerrit

  • Author_Institution
    Stevens Inst. of Technol., Hoboken, NJ
  • fYear
    2007
  • fDate
    15-16 Oct. 2007
  • Firstpage
    189
  • Lastpage
    196
  • Abstract
    Process modeling and rule modeling languages are both used to document organizational policies and procedures. However, little work has been done to understand their synergies and overlap. Understanding the relationship between the two modeling types would allow organizations to maximize synergies and reduce their modeling effort. In this paper we use the well-established Bunge-Wand-Weber (BWW) representation theory to compare the representation capabilities of both types of languages. We perform a representational analysis of two rule modeling languages, viz., SRML and SBVR. We compare their representation capabilities with those of four popular conceptual business process modeling languages, and focus on the aspects of maximum ontological completeness and minimum ontological overlap. The outcome of this study shows that no single language is internally complete with respect to the BWW representation model and that a combination of two languages, viz. SRML and BPMN, is better suited for process modeling than any single modeling language.
  • Keywords
    business data processing; knowledge representation languages; Bunge-Wand-Weber representation theory; business process; business rule modeling; modeling languages; organizational policies; representational analysis; rule modeling languages; Conferences; Context modeling; Markup languages; Ontologies; Outsourcing; Performance analysis; Portfolios; Vocabulary;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    EDOC Conference Workshop, 2007. EDOC '07. Eleventh International IEEE
  • Conference_Location
    Annapolis, MD
  • Electronic_ISBN
    978-0-7695-3338-4
  • Type

    conf

  • DOI
    10.1109/EDOCW.2007.8
  • Filename
    4566972